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Rapid Thermal Processing for Future Semiconductor Devices
Fukuda, H. (Muroran Institute of Technology, Department of Electrical and Electronic Engineering, Mizumoto-cho, Muroran, Hokkaido, Japan)
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Rapid Thermal Processing for Future Semiconductor Devices
Fukuda, H. (Muroran Institute of Technology, Department of Electrical and Electronic Engineering, Mizumoto-cho, Muroran, Hokkaido, Japan)
A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.
160 pages
Medie | Bøger Paperback Bog (Bog med blødt omslag og limet ryg) |
Udgivet | 2. april 2003 |
ISBN13 | 9780444513397 |
Forlag | Elsevier Science & Technology |
Antal sider | 160 |
Mål | 172 × 243 × 17 mm · 310 g |